SPIE: Optical lithography pushes the limits

被引：0

作者：

不详

机构：

来源：

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：52 / 52

页数：1

共 50 条

[1] Preserving Moore's Law Pushes Lithography to its Limits
Freebody, Marie
[J]. PHOTONICS SPECTRA, 2011, 45 (05) : 45 - 47
[2] LIMITS OF OPTICAL LITHOGRAPHY
WILCZYNSKI, JS
[J]. POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16): : 1145 - 1145
[3] Limits of optical lithography
Maenhoudt, M
Verhaegen, S
Ronse, K
Zandbergen, P
Muzio, E
[J]. OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 : 373 - 387
[4] RESOLUTION LIMITS OF OPTICAL LITHOGRAPHY
OKAZAKI, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2829 - 2833
[5] The new, new limits of optical lithography
Mack, CA
[J]. EMERGING LITHOGRAPHIC TECHNOLOGIES VIII, 2004, 5374 : 1 - 8
[6] Optical lithography pushes to 0.1-mu m feature sizes
Myrvaagnes, R
[J]. ELECTRONIC PRODUCTS MAGAZINE, 1996, 39 (04): : 18 - 18
[7] EUV lithography progress emphasized at SPIE Advanced Lithography
不详
[J]. SOLID STATE TECHNOLOGY, 2017, 60 (03) : 8 - 8
[8] SPIE lithography symposium featured innovations
不详
[J]. SOLID STATE TECHNOLOGY, 1997, 40 (06) : 56 - &
[9] The impact of backside particles on the limits of optical lithography
Bearda, T
Mertens, PW
Holsteyns, F
De Bisschop, P
Compen, R
van Meer, A
Heyns, MM
[J]. ULTRA CLEAN PROCESSING OF SILICON SURFACES VII, 2005, 103-104 : 129 - 132
[10] Intel pushes lithography limits, co-optimizes design/layout/process at 45nm
James, Dick
[J]. SOLID STATE TECHNOLOGY, 2008, 51 (03) : 30 - 33