RF Characteristics of AlGaN/GaN HEMTs under Different Temperatures

被引:0
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作者
Chiu, Yu-Sheng [1 ]
Huang, Jui-Chien [1 ]
Lin, Tai-Ming [1 ]
Chou, Yu-Ting [1 ]
Lu, Chung-Yu [1 ]
Chang, Chia-Ta [1 ]
Chang, Edward Yi [1 ]
机构
[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30010, Taiwan
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present the Rf characteristics of 0.7-mu m gate length n-GaN/AlGaN/GaN high-electron mobility transistors (HEMTs) with different source-drain spacing tested under different temperatures.. The 7-mu m source-drain spacing device demonstrated 800 mA/mm drain current density and 257 mS/mm tranceconductance, and the 5-mu m source-drain spacing device demonstrated 700 mA/mm drain current density and 260 mS/mm tranconductance. The 7-mu m source-drain spacing device was measured at room temperatures of 25 degrees C and -40 degrees C, the current gain (f(T)) were 18 GHz and 21GHz and the maximum oscillation (f(max)(U)) frequency were 63 GHz-and 87 GHz, respectively The f(T) was nearly linearly dependent on the temperature. As operating temperature increased from -40 degrees C to 50 degrees C, the f(T) dropped more dramatically for the 5-mu m SD spacing device than for the 7-mu m device. The f(max) characteristic of 5-mu m SD spacing device decreases more dramatically above 125 degrees C than the 7-mu m SD spacing device. This phenomenon might be due to stronger phonon scattering for shorter channel device at high temperatures.
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页码:411 / 413
页数:3
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