Adsorbate-induced faceting of high-index semiconductor surfaces: antimony adsorbed on Ge(103)

被引:2
|
作者
Falkenberg, G [1 ]
Johnson, RL [1 ]
机构
[1] Univ Hamburg, Inst Expt Phys 2, D-22761 Hamburg, Germany
关键词
antimony; faceting; Ge(103); chemisorption; high index single crystal surface; low-energy electron diffraction (LEED); reflection high-energy electron diffraction (RHEED); scanning tunneling microscopy; solid phase epitaxy; surface structure; morphology; roughness and topography;
D O I
10.1016/S0169-4332(98)00637-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Scanning tunneling microscopy, low-energy electron diffraction and reflection high-energy electron diffraction were used to monitor changes in the morphology of Ge(103) surfaces after adsorption of antimony and annealing at different temperatures for various durations. After deposition of Sb at room temperature, the Sb-covered Ge(103) surface breaks up on annealing into small irregular pyramids, which coalesce and form more regular quasi-one-dimensional 'hill-and-valley' structures bounded by reconstructed {113} facets. The average periodicity of the structures approaches a constant maximum value in the nanometer range. The symmetry of the substrate with respect to the facets constrains the formation of single domain nanostructures. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:81 / 87
页数:7
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