Spray pyrolysis deposition of copper indium disulfide thin films

被引:14
|
作者
Fujiwara, T
Okuya, M
Kaneko, S
机构
[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Shizuoka Univ, Dept Mat Sci & Technol, Hamamatsu, Shizuoka 4328561, Japan
关键词
spray pyrolysis deposition; copper indium disulfide; thin film; photovoltaics;
D O I
10.2109/jcersj.110.81
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Copper indium disulfide (CuInS2) thin films were successfully prepared from non-chlorinated starting materials on glass substrates by a spray pyrolysis deposition (SPD) method. The spray solutions were composed of water-ethanol (1:1 in volume) including copper acetate, indium acetylacetonate, and thiourea. The experimental parameters for the stoichiometric and well-crystallized CuInS2 thin film formation were determined as follows: spraying rate 1.0 ml/s, spraying period 0.5 s, substrate temperature 350degreesC, and S/(Cu + In) ratio of the spray solution 1.25. The dark brown CuInS2 thin film obtained was composed of rounded grains 1-3 mum in size with a direct band gap of 1.48 eV. The CuInS2/CdS heterojunction fabricated by the SPD method presented photovoltaic characteristics, though the current was only 5 muA.
引用
收藏
页码:81 / 85
页数:5
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