Exploring the Influence of a Focusing and Gaussian Profile Electron Beam in SEM Imaging through Monte Carlo Simulation

被引：8
|
作者：
Zhang, P. [1 ,2 ]
机构：
[1] Yangtze Normal Univ, Sch Elect Informat Engn, Chongqing 408003, Peoples R China
[2] Huazhong Univ Sci & Technol, Tongji Med Coll, Sch Pharm, Wuhan 430030, Hubei, Peoples R China
来源：
MOSCOW UNIVERSITY PHYSICS BULLETIN | 2018年 / 73卷 / 01期
关键词：
LINEWIDTH MEASUREMENTS; IMAGES; MICROSCOPY; SCATTERING; SOLIDS;
D O I：
10.3103/S0027134918010174
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Gaussian profile is conventionally assumed as the probe shape of the incident electron beam in theoretical analysis of dimensional measurements by a scanning electron microscope (SEM). However, it is not suitable for samples with small and tiny structure. In this paper, a model of a focusing electron beam with finite width due to aberration was used in simulating the SEM image of gold particles/balls on a carbon substrate. An effective electron beam shape (EEBS) was displayed and was found that it deviates significantly from the Gaussian profile. The difference between images simulated by Monte Carlo method with ideal electron incident beam, electron beam focusing model and with ideal beam incident then convoluted by Gaussian profile were discussed in detail. Furthermore, the influence of external electric field effect: full extraction and no extraction for imaging were studied.
引用
收藏
页码：89 / 94
页数：6
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