Epitaxial growth of SrTiO3 (0 0 1) films on multilayer buffered GaN (0 0 0 2) by pulsed laser deposition

被引:2
|
作者
Luo, W. B. [1 ,2 ]
Jing, J. [1 ]
Shuai, Y. [1 ,2 ]
Zhu, J. [1 ]
Zhang, W. L. [1 ]
Zhou, S. [2 ]
Gemming, S. [2 ]
Du, N. [3 ]
Schmidt, H. [3 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
[2] Helmholtz Zentrum Dresden Rossendorf HZDR eV, Inst Ion Beam Phys & Mat Res, D-01314 Dresden, Germany
[3] Tech Univ Chemnitz, Fac Elect Engn & Informat Technol, Dept Mat Nanoelect, Chemnitz, Germany
关键词
FIELD-EFFECT TRANSISTORS; THIN-FILMS; LAYER;
D O I
10.1088/0022-3727/46/6/065307
中图分类号
O59 [应用物理学];
学科分类号
摘要
SrTiO3 films were grown on CeO2/YSZ/TiO2 multilayer buffered GaN/Al2O3 (0 0 0 1) substrates with and without the YBa2Cu3O7-x (YBCO) bridge layer by pulsed laser deposition (PLD). The deposition process of the buffer layers was in situ monitored by reflection high-energy electron diffraction. The crystallographical orientation of the heterostructure was studied by x-ray diffraction (XRD). With the introduction of the YBCO (0 0 1) layer, the STO (0 0 1) film was epitaxially grown on the GaN substrate. There were three sets of inplane domains separated from each other by 30 degrees in both STO and YBCO buffer layers. The epitaxial relationship was STO (0 0 2)[1 1 0]parallel to YBCO(0 0 1)[1 1 0]parallel to CeO2(0 0 2)[0 1 0]parallel to YSZ (0 0 2)[0 1 0]parallel to GaN(0 0 0 1)[1 1 -2 0] according to XRD results. By comparing the orientation of STO grown on GaN with and without the YBCO top buffer layer, the surface chemical bonding was found to be a very important factor in determining the orientation relationship of STO.
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页数:6
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