Room-temperature weak ferromagnetism of amorphous HfAlOx thin films deposited by pulsed laser deposition

被引：9
|
作者：
Qiu, X. Y.
Liu, Q. M.
Gao, F.
Lu, L. Y.
Liu, J. -M. [1 ]
机构：
[1] Nanjing Univ, Solid State Microstruct Lab, Nanjing 210093, Peoples R China
[2] Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110016, Peoples R China
来源：
APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 24期
基金：
中国国家自然科学基金;
关键词：
D O I：
10.1063/1.2405883
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The room-temperature weak ferromagnetism of amorphous HfAlOx thin films deposited by pulsed laser deposition on various substrates in oxygen-defective ambient is demonstrated. The magnetization is independent of film thickness, but depends on substrates and deposition temperatures. A magnetic moment of similar to 0.26 mu(B) per HfAlOx f.u. is recorded for HfAlOx films deposited under optimized conditions [deposited at 600 degrees C on (001) sapphire in high vacuum]. It is argued that interfacial defects are one of the possible sources of the weak ferromagnetism. (c) 2006 American Institute of Physics.
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