Modeling and Analysis of Normally-OFF p-GaN Gate AlGaN/GaN HEMT as an ON-Chip Capacitor

被引:23
|
作者
Abdulsalam, Azwar [1 ]
Karumuri, Naveen [2 ]
Dutta, Gourab [1 ]
机构
[1] IIT Kharagpur, Dept Elect & Elect Commun Engn, Kharagpur 721302, W Bengal, India
[2] Globalfoundries, RF Compact Modeling Team, Bangalore 560045, Karnataka, India
关键词
2-D electron gas (2DEG) density; capacitance; equivalent circuit model; GaN high electron mobility transistor (HEMT); modeling; normally-OFF; p-GaN gate; THRESHOLD VOLTAGE; METAL; LAYER;
D O I
10.1109/TED.2020.3007370
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An accurate physics-based analytical model for the gate capacitanceof p-GaN gate AlGaN/GaN high electron mobility transistor (HEMT) is presented. The Poisson's equation is formulated considering the incomplete ionization of acceptorsin the p-GaN cap layer and the out-diffusion ofMg acceptors into the AlGaN barrier layer, which is solved in conjunction with the charge equation in the AlGaN/GaN quantum well. The model is validated across a wide bias range and shows a good agreement with the experimental results. The effect of individual device parameters on the capacitance-voltage (C-V) characteristics is also analyzed using this model. A simplified equivalent circuit model is also presented to intuitively explain the C-V characteristics of these normally-OFF devices.
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页码:3536 / 3540
页数:5
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