Nanoflower ZnO thin-film grown by hydrothermal technique based Schottky diode

This paper reports the realization of planar Schottky diodes based on nanorod ZnO thin film. The nanorod ZnO thin film was fabricated by hydrothermal technique on boron doped p-type Si (100) substrate. The Ag//ZnO/Al planar diode operating with voltage bias from -3 to 3 V. TheI-Vcharacteristics clearly indicate that the devices have rectifying performance. The thermionic emission theory governs the current across the studied Schottky diode. The device achieved a turn-on voltage of 0.9 V, barrier height 0.69 eV and saturation current of 1.2 x 10(-6)A. The diode shows a very large ideality factor (n> > 2) which is attributed to high interface trap concentration. The surface topology was investigated by scanning electron microscope (SEM). The structural properties of the nanostructured ZnO thin film were characterized by X-ray diffraction (XRD). The SEM images reveal that the ZnO nanorods grow perpendicular to the substrate with uniformity and high density. The XRD pattern illustrates the dominant peak appearing at (002). This intense peak indicates thec-axis orientated phase of the wurtzite ZnO structure. It demonstrates that the crystals grow uniformly perpendicular to the substrate surface in good agreement with the SEM images.