High-temperature threshold characteristics of a symmetrically graded InAlAs/InxGa1-xAs/GaAs metamorphic high electron mobility transistor

被引:12
|
作者
Lee, C. S.
Chen, Y. J.
Hsu, W. C.
Su, K. H.
Huang, J. C.
Huang, D. H.
Wu, C. L.
机构
[1] Feng Chia Univ, Dept Elect Engn, Taichung 40724, Taiwan
[2] United Microelect Corp, Tainan Sci Based Ind Pk, Hsin Shi 744, Tainan, Taiwan
[3] Transcom Inc, Tainan Sci Based Ind Pk, Hsin Shi 744, Tainan, Taiwan
[4] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 70101, Taiwan
关键词
D O I
10.1063/1.2208926
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-temperature threshold characteristics of a symmetrically graded delta-doped InAlAs/InxGa1-xAs/GaAs (x=0.5 -> 0.65 -> 0.5) metamorphic high electron mobility transistor (MHEMT) have been investigated. The thermal threshold coefficients, defined as partial derivative V-th/partial derivative T, are superiorly low at 0.9 mV/K from 300 to 420 K and at -0.75 mV/K from 420 to 500 K. An interesting polarity change of the thermal threshold coefficient was observed around 420 K due to the variation of thermal modulation effects. The present MHEMT device, with stabilized thermal threshold variations and superior high-temperature linearity characteristics, is promising for high-temperature circuit applications.
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页数:3
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