Combined ozone/HF/HCl based cleaning and adjusted emitter etch-back for silicon solar cells

被引：15
|
作者：
Moldovan, Anamaria [1 ]
Birmann, Katrin [1 ]
Rentsch, Jochen [1 ]
Zimmer, Martin [1 ]
Gitte, Thomas [2 ]
Fittkau, Jens [3 ]
机构：
[1] Fraunhofer ISE, Heidenhofstr 2-4, D-79110 Freiburg, Germany
[2] Singulus Stangl Solar GmbH, Freiburg, Germany
[3] ASTeX GmbH Berlin, Freiburg, Germany
来源：
ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES XI | 2013年 / 195卷
关键词：
ozone; sheet resistance change; selective emitter; etch amount; REMOVAL; HF; EFFICIENCY; OZONE;
D O I：
10.4028/www.scientific.net/SSP.195.305
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：305 / +
页数：3
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