Synthesis, properties and performances of electrodeposited bismuth telluride films

被引：116
|
作者：
Magri, P
Boulanger, C
Lecuire, JM
机构：
[1] Laboratoire d'Electrochimie des Matériaux, URA CNRS 158, Université de Metz, Ile du Saulcy
来源：
JOURNAL OF MATERIALS CHEMISTRY | 1996年 / 6卷 / 05期
关键词：
D O I：
10.1039/jm9960600773
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Bismuth telluride alloy films of uniform thickness have been successfully prepared by electrodeposition from a solution containing Bi3+ and HTeO2+ ions in 1 mol dm(-3) nitric acid (pH = 0) on stainless steel. The electrodeposited films are monophasic and exhibit a polycrystalline structure (R(3) over barm$). The film composition is dependent on the electrolyte composition and the current density. The electrical properties of the electrodeposited samples have been determined. The obtained films are n-type semiconductors with high carrier concentration.
引用
收藏
页码：773 / 779
页数：7
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