Photoallergic contact dermatitis due to flufenamic acid and etofenamate

被引：8
|
作者：
Montoro, J
RodriguezSerna, M
Linana, JJ
Ferre, MA
SanchezMotilla, JM
机构：
[1] UNIV VALENCIA,HOSP LA FE,DEPT ANESTESIA & CLIN DOLOR,VALENCIA 46009,SPAIN
[2] UNIV VALENCIA,GEN HOSP,DERMATOL SERV,VALENCIA 46014,SPAIN
来源：
CONTACT DERMATITIS | 1997年 / 37卷 / 03期
关键词：
flufenamic acid; etofenamate; photoallergic contact dermatitis; positive photopatch test;
D O I：
10.1111/j.1600-0536.1997.tb00332.x
中图分类号：
R392 [医学免疫学];
学科分类号：
100102 ;
摘要：
[No abstract available]
引用
收藏
页码：139 / 140
页数：2
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