Photoluminescence and ultraviolet lasing of polycrystalline ZnO thin films prepared by the oxidation of the metallic Zn

被引:554
|
作者
Cho, SL [1 ]
Ma, J
Kim, YK
Sun, Y
Wong, GKL
Ketterson, JB
机构
[1] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA
[2] Hong Kong Univ Sci & Technol, Dept Phys, Hong Kong, Peoples R China
[3] Northwestern Univ, Dept Elect & Comp Engn, Evanston, IL 60208 USA
关键词
D O I
10.1063/1.125141
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report a simple method for preparing polycrystalline ZnO thin films with good luminescent properties: the oxidization of metallic Zn films. In photoluminescence (PL) studies at room temperature for wavelengths between 370 and 675 nm, we have observed a single exciton peak around 390 nm without any deep-level emission and a small PL full width at half maximum (23 meV), indicating that the concentrations of the defects responsible for the deep-level emissions are negligible. We have also observed optically pumped lasing action in these films. The threshold intensity for lasing was similar to 9 MW/cm(2). (C) 1999 American Institute of Physics. [S0003-6951(99)03444-0].
引用
收藏
页码:2761 / 2763
页数:3
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