Dielectric function of wurtizite GaN and AlN thin films

被引:73
|
作者
Benedict, LX [1 ]
Wethkamp, T
Wilmers, K
Cobet, C
Esser, N
Shirley, EL
Richter, W
Cardona, M
机构
[1] Lawrence Livermore Natl Lab, H Div, Phys Directorate, Livermore, CA 94550 USA
[2] Tech Univ Berlin, Inst Festkorperphys, D-10623 Berlin, Germany
[3] Max Planck Inst Festkorperforsch, D-70569 Stuttgart, Germany
[4] NIST, Opt Technol Div, Phys Lab, Gaithersburg, MD 20899 USA
关键词
semiconductors; electronic band structure; optical properties; synchrotron radiation;
D O I
10.1016/S0038-1098(99)00323-3
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Measurements and calculations of the dielectric function of wurtzite GaN and AIN are presented. Spectroscopic ellipsometry was used to determine epsilon(omega) Of thin film samples in the energy range from 3 to 9.8 eV. Calculations of epsilon(omega) for the bulk materials were performed within a first-principles electronic structure scheme that includes the electron-hole interaction. The agreement between experiment and theory is dramatically improved over the previous work, a result of improvements in both experimental technique and theoretical description. The predicted polarization dependence of the dielectric function of these materials exhibits features similar to that in other wurtzite structure materials. (C) 1999 Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:129 / 133
页数:5
相关论文
共 50 条
  • [1] Dielectric function of wurtzite GaN and AlN thin films
    H Division, Phys. Direct., Lawrence Livermore N., Livermore, CA 94550, United States
    不详
    不详
    不详
    Solid State Commun, 3 (129-133):
  • [2] Atomic Layer Deposition of AlN Thin Films on GaN and Electrical Properties in AlN/GaN Heterojunction Diodes
    Kim, Hogyoung
    Yun, Hee Ju
    Choi, Seok
    Choi, Byung Joon
    TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, 2020, 21 (06) : 621 - 629
  • [3] Atomic Layer Deposition of AlN Thin Films on GaN and Electrical Properties in AlN/GaN Heterojunction Diodes
    Hogyoung Kim
    Hee Ju Yun
    Seok Choi
    Byung Joon Choi
    Transactions on Electrical and Electronic Materials, 2020, 21 : 621 - 629
  • [4] Pulsed excimer laser processing of AlN/GaN thin films
    Wong, WS
    Schloss, LF
    Sudhir, GS
    Linder, BP
    Yu, KM
    Weber, ER
    Sands, T
    Cheung, NW
    III-V NITRIDES, 1997, 449 : 1011 - 1016
  • [5] Mechanical Properties of Cubic SiC, GaN and AlN Thin Films
    Pezoldt, Joerg
    Grieseler, Rolf
    Schupp, Thorsten
    As, Donat J.
    Schaaf, Peter
    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 513 - +
  • [6] Dielectric properties and thickness metrology of strain engineered GaN/AlN/Si (111) thin films grown by MOCVD
    Tungare, M.
    Kamineni, V. K.
    Shahedipour-Sandvik, F.
    Diebold, A. C.
    THIN SOLID FILMS, 2011, 519 (09) : 2929 - 2932
  • [7] Determination of the anisotropic dielectric function for wurtzite AlN and GaN by spectroscopic ellipsometry
    Shokhovets, S
    Goldhahn, R
    Gobsch, G
    Piekh, S
    Lantier, R
    Rizzi, A
    Lebedev, V
    Richter, W
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (01) : 307 - 312
  • [8] Thermal conductivity of AlN and AlN-GaN thin films deposited on Si and GaAs substrates
    Bodzenta, J
    Burak, B
    Jagoda, A
    Stanczyk, B
    DIAMOND AND RELATED MATERIALS, 2005, 14 (3-7) : 1169 - 1174
  • [9] Dielectric function of antiferroelectric thin films
    Wesselinowa, JM
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2005, 242 (07): : 1528 - 1536
  • [10] Growth of GaN and AlN thin films by laser induced molecular beam epitaxy
    Gross, M
    Henn, G
    Schroder, H
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 50 (1-3): : 16 - 19