The universal method for optimization of undulator tapering in FEL amplifiers

被引：2
|
作者：
Schneidmiller, E. A. [1 ]
Yurkov, M. V. [1 ]
机构：
[1] DESY, Zeuthen, Germany
来源：
ADVANCES IN X-RAY FREE-ELECTRON LASERS INSTRUMENTATION III | 2015年 / 9512卷
关键词：
Free electron laser; x-ray laser; High efficiency; FREE-ELECTRON LASER; EXTREME-ULTRAVIOLET; HIGH-EFFICIENCY; EXTRACTION; OPERATION;
D O I：
10.1117/12.2181230
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Technique of undulator tapering in the post-saturation regime is used at the existing x-ray FELs for increasing the radiation power. There are also discussions on the future of high peak and average power FELs for scientific and industrial applications. Diffraction effects essentially influence on the choice of the tapering strategy. Recent studies resulted in an general law of the undulator tapering for a seeded FEL amplifier. In this paper we extend these results for the case of the Self Amplified Spontaneous Emission (SASE) FEL.
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页数：11
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