Stress induced during the Solid-Phase Crystallization of amorphous silicon deposited by LPCVD

被引：0
|
作者：
MohammedBrahim, T [1 ]
KisSion, K [1 ]
Briand, D [1 ]
Sarret, M [1 ]
Lebihan, F [1 ]
Fortin, B [1 ]
机构：
[1] UNIV RENNES 1,GMV,F-35042 RENNES,FRANCE
来源：
POLYCRYSTALLINE THIN FILMS: STRUCTURE, TEXTURE, PROPERTIES, AND APPLICATIONS II | 1996年 / 403卷
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D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
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页码：513 / 518
页数：6
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