Imaging ellipsometry for high-spatial-resolution metrology

被引：1

作者：

Zhan, QW ^{[1
]}

Leger, JR ^{[1
]}

机构：

[1] Univ Minnesota, Dept Elect & Comp Engn, Minneapolis, MN 55455 USA

来源：

WAVE OPTICS AND VLSI PHOTONIC DEVICES FOR INFORMATION PROCESSING | 2001年 / 4435卷

关键词：

D O I：

10.1117/12.451132

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

引用

页码：65 / 76

页数：12

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