RIFM fragrance ingredient safety assessment, lauric acid, CAS Registry Number 143-07-7

被引：0

作者：

Api, A. M. ^{[1
]}

Belsito, D. ^{[2
]}

Biserta, S. ^{[1
]}

Botelho, D. ^{[1
]}

Bruze, M. ^{[3
]}

Burton, G. A., Jr. ^{[4
]}

Buschmann, J. ^{[5
]}

Cancellieri, M. A. ^{[1
]}

Dagli, M. L. ^{[6
]}

Date, M. ^{[1
]}

Dekant, W. ^{[7
]}

Deodhar, C. ^{[1
]}

Fryer, A. D. ^{[8
]}

Gadhia, S. ^{[1
]}

Jones, L. ^{[1
]}

Joshi, K. ^{[1
]}

Lapczynski, A. ^{[1
]}

Lavelle, M. ^{[1
]}

Liebler, D. C. ^{[9
]}

Na, M. ^{[1
]}

O'Brien, D. ^{[1
]}

Patel, A. ^{[1
]}

Penning, T. M. ^{[10
]}

Ritacco, G. ^{[1
]}

Rodriguez-Ropero, F. ^{[1
]}

Romine, J. ^{[1
]}

Sadekar, N. ^{[1
]}

Salvito, D. ^{[1
]}

Schultz, T. W. ^{[11
]}

Siddiqi, F. ^{[1
]}

Sipes, I. G. ^{[12
]}

Sullivan, G. ^{[1
]}

Thakkar, Y. ^{[1
]}

Tokura, Y. ^{[13
,14
]}

Tsang, S. ^{[1
]}

机构：

[1] Res Inst Fragrance Mat Inc, 50 Tice Blvd, Woodcliff Lake, NJ 07677 USA

[2] Columbia Univ, Dept Dermatol, Expert Panel, Med Ctr, 161 Ft Washington Ave, New York, NY 10032 USA

[3] Malmo Univ Hosp, Dept Occupat & Environm Dermatol, Expert Panel, Sodra Forstadsgatan 101,Entrance 47, SE-20502 Malmo, Sweden

[4] Univ Michigan, Sch Nat Resources & Environm, Dana Bldg G110,440 Church St, Ann Arbor, MI 48109 USA

[5] Fraunhofer Inst Toxicol & Expt Med, Expert Panel, Nikolai Fuchs Str 1, D-30625 Hannover, Germany

[6] Univ Sao Paulo, Sch Vet Med & Anim Sci, Dept Pathol, Expert Panel, Av Prof Dr Orlando Marques de Paiva 87, BR-05508900 Sao Paulo, Brazil

[7] Univ Wurzburg, Dept Toxicol, Expert Panel, Versbacher Str 9, D-97078 Wurzburg, Germany

[8] Oregon Hlth & Sci Univ, Expert Panel, 3181 SW Sam Jackson Pk Rd, Portland, OR 97239 USA

[9] Vanderbilt Univ, Ctr Mol Toxicol, Dept Biochem, Expert Panel,Sch Med, 638 Robinson Res Bldg,2200 Pierce Ave, Nashville, TN 37232 USA

[10] Univ Penn, Ctr Excellence Environm Toxicol, Perelman Sch Med, Expert Panel, 1316 Biomed Res Bldg BRB 2-3,421 Curie Blvd, Philadelphia, PA 19104 USA

[11] Univ Tennessee, Coll Vet Med, Dept Comparat Med, Expert Panel, 2407 River Dr, Knoxville, TN 37996 USA

[12] Univ Arizona, Coll Med, Dept Pharmacol, Expert Panel, 1501 North Campbell Ave,POB 245050, Tucson, AZ 85724 USA

[13] Hamamatsu Univ Sch Med, Expert Panel, Journal Dermatol Sci JDS, Higashi Ku, 1-20-1 Handayama, Hamamatsu, Shizuoka 4313192, Japan

[14] Hamamatsu Univ Sch Med, Dept Dermatol, Higashi Ku, 1-20-1 Handayama, Hamamatsu, Shizuoka 4313192, Japan

来源：

FOOD AND CHEMICAL TOXICOLOGY | 2020年 / 141卷

关键词：

PERSONAL CARE; CONSUMER EXPOSURE; MODEL; ABSORPTION; COSMETICS; THRESHOLD;

D O I：

10.1016/j.fct.2020.111383

中图分类号：

TS2 [食品工业];

学科分类号：

0832 ;

摘要：

The existing information supports the use of this material as described in this safety assessment. Lauric acid was evaluated for genotoxicity, repeated dose toxicity, reproductive toxicity, local respiratory toxicity, phototoxicity/photoallergenicity, skin sensitization, and environmental safety. Data from read-across analog 10-undecenoic acid (CAS # 112-38-9) show that lauric acid is not expected to be genotoxic. Data on read-across analog octanoic acid, (CAS # 124-07-2) provide a calculated MOE > 100 for the repeated dose toxicity and reproductive toxicity endpoints. Based on the existing data, lauric acid does not present a concern for skin sensitization under the current declared levels of use. The phototoxicity/photoallergenicity endpoints were evaluated based on UV spectra; lauric acid is not expected to be phototoxic/photoallergenic. The local respiratory toxicity endpoint was evaluated using the TTC for a Cramer Class I material, and the exposure to lauric acid is below the TTC (1.4 mg/day). The environmental endpoints were evaluated; lauric acid was found not to be PBT as per the IFRA Environmental Standards, and its risk quotients, based on its current volume of use in Europe and North America (i.e., PEC/PNEC), are < 1.

引用

页数：8

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Biserta, S.
Botelho, D.
Bruze, M.
Burton, G. A., Jr.
Buschmann, J.
Cancellieri, M. A.
Dagli, M. L.
Date, M.
Dekant, W.
Deodhar, C.
Fryer, A. D.
Gadhia, S.
Jones, L.
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Na, M.
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Penning, T. M.
Ritacco, G.
Romine, J.
Sadekar, N.
Schultz, T. W.
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Sipes, I. G.
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Dekant, W.
Deodhar, C.
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Joshi, K.
Kumar, M.
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Lavelle, M.
Lee, I.
Liebler, D. C.
Moustakas, H.
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Penning, T. M.
Ritacco, G.
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