Model for atomic layer deposition on inner wall of rectangular pipes with large aspect ratio

被引：0
|
作者：
Xiong, Yuqing [1 ]
Dong, Maojin [1 ]
Li, Kun [1 ]
Wang, Jizhou [1 ]
Ren, Ni [1 ]
机构：
[1] Lanzhou Inst Phys, Sci & Technol Surface Engn Lab, Lanzhou 730000, Peoples R China
来源：
EIGHTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS | 2013年 / 9068卷
关键词：
Atomic layer deposition; Model; Inner wall; Rectangular pipe; Aluminum;
D O I：
10.1117/12.2053143
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Feasibility of thin films deposited on inner wall of rectangular pipes with length aspect ratio up to 50 by atomic layer deposition was studied, by solving kinetics equation of gas adsorption on inner wall of pipes. And the time for reactants to reach saturated adsorption in pipes was calculated. Furthermore, the process of thin film deposition by atomic layer deposition was simulated by Kinetic Monte Carlo method, and a growth model for atomic layer deposition of aluminum on inner wall of long rectangular pipes was established.
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页数：6
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