Structural and optical properties of AlxOy/Pt/AlxOy multilayer absorber
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作者:
Nuru, Z. Y.
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Natl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South Africa
Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaNatl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South Africa
Nuru, Z. Y.
[1
,2
]
Arendse, C. J.
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Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaNatl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South Africa
Arendse, C. J.
[2
]
Muller, T. F. G.
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Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaNatl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South Africa
Muller, T. F. G.
[2
]
Maaza, M.
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Natl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South AfricaNatl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South Africa
Maaza, M.
[1
]
机构:
[1] Natl Res Fdn, NANOAFNET, MRD iThemba LABS, ZA-7129 Somerset W, South Africa
[2] Univ Western Cape, Dept Phys, ZA-7535 Bellville, South Africa
We report on the microstructure and optical properties of AlxOy-Pt-AlxOy interference-type multilayer films, deposited by electron beam (e-beam) deposition onto corning 1737 glass, silicon (1 1 1) and copper substrates. The structural properties were investigated by Rutherford backscattering spectrometry, X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy and atomic force microscopy. The optical properties were extracted from specular reflection/transmission, diffuse reflectance and emissometer measurements. The stratification of the coatings consists of a semi-transparent middle Pt layer sandwiched between two layers of AlxOy. The top and bottom AlxOy layers were non-stoichiometric with no crystalline phases present. The Pt layer is in the fcc crystalline phase with a broad size distribution and spheroidal shape in and between the rims of AlxOy. The surface roughness of the stack was found to be comparable to the inter-particle distance. The optical calculations confirm a high solar absorptance of similar to 0.94 and a low thermal emittance of similar to 0.06 for the multilayer stack, which is attributed not only to the optimized nature of the multilayer interference stacks, but also to the specific surface morphology and texture of the coatings. These optical characteristics validate the spectral selectivity of the AlxOy-Pt-AlxOy interference-type multilayer stack for use in high temperature solar-thermal applications. (c) 2012 Elsevier B.V. All rights reserved.
机构:
Univ Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, TanzaniaUniv Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, Tanzania
Tibaijuka, Justine J.
Nyarige, Justine S.
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Univ Pretoria, Dept Phys, Private Bag X20, ZA-0028 Hatfield, South AfricaUniv Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, Tanzania
Nyarige, Justine S.
Diale, Mmantsae
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Univ Pretoria, Dept Phys, Private Bag X20, ZA-0028 Hatfield, South AfricaUniv Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, Tanzania
Diale, Mmantsae
Mlyuka, Nuru R.
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Univ Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, TanzaniaUniv Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, Tanzania
Mlyuka, Nuru R.
Samiji, Margaret E.
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Univ Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, TanzaniaUniv Dar Es Salaam, Dept Phys, POB 35063, Uvumbuzi Rd, Dar Es Salaam, Tanzania
机构:
Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaiThemba LABS Natl Res Fdn, Nanosci African Network NANOAFNET, ZA-7129 Somerset West, South Africa
Arendse, C. J.
Muller, T. F.
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Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaiThemba LABS Natl Res Fdn, Nanosci African Network NANOAFNET, ZA-7129 Somerset West, South Africa
机构:
iThemba LABS Gauteng, ZA-2050 Johannesburg, South AfricaNatl Res Fdn, iThemba LABS, Nanosci African Network NANOAFNET, ZA-7129 Somerset West, South Africa
Msimanga, M.
Arendse, C. J.
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Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaNatl Res Fdn, iThemba LABS, Nanosci African Network NANOAFNET, ZA-7129 Somerset West, South Africa
机构:
Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaUniv South Africa UNISA, UNESCO UNISA Africa Chair Nanosci Nanotechnol, Coll Grad Studies, Pretoria, South Africa
机构:
Natl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South Africa
Univ Western Cape, Dept Phys, Bellville, South AfricaNatl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South Africa
Nuru, Z. Y.
Arendse, C. J.
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h-index: 0
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Univ Western Cape, Dept Phys, Bellville, South AfricaNatl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South Africa
Arendse, C. J.
Khamlich, S.
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Natl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South AfricaNatl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South Africa
Khamlich, S.
Maaza, M.
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Natl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South AfricaNatl Res Fdn, MRD iThemba LABS, NANOAFNET, Somerset W, South Africa
机构:
Univ Western Cape, Dept Phys, ZA-7535 Bellville, South AfricaUniv South Africa UNISA, Coll Grad Studies, UNESCO UNISA Africa Chair Nanosci Nanotechnol, Pretoria, South Africa
Arendse, C. J.
Mongwaketsi, N.
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IThemba LABS Natl Res Fdn, Nanosci African Network NANOAFNET, ZA-7129 Somerset West, South AfricaUniv South Africa UNISA, Coll Grad Studies, UNESCO UNISA Africa Chair Nanosci Nanotechnol, Pretoria, South Africa
Mongwaketsi, N.
Gohshal, S. K.
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Univ Teknol Malaysia, Fac Sci, Dept Phys, AOMRG, Utm Skudai 81310, Johor, MalaysiaUniv South Africa UNISA, Coll Grad Studies, UNESCO UNISA Africa Chair Nanosci Nanotechnol, Pretoria, South Africa
Gohshal, S. K.
Nkosi, M.
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IThemba LABS Natl Res Fdn, Nanosci African Network NANOAFNET, ZA-7129 Somerset West, South AfricaUniv South Africa UNISA, Coll Grad Studies, UNESCO UNISA Africa Chair Nanosci Nanotechnol, Pretoria, South Africa
机构:
Univ Zululand, Dept Phys & Engn, ZA-3886 Kwa Dlangezwa, South AfricaUniv Zululand, Dept Phys & Engn, ZA-3886 Kwa Dlangezwa, South Africa
Khoza, N.
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Nuru, Z. Y.
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Sackey, J.
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Kotsedi, L.
Matinise, N.
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Univ South Africa UNISA, Coll Grad Studies, UNESCO UNISA Africa Chair Nanosci Nanotechnol, POB 392, Pretoria, South Africa
Natl Res Fdn, iThemba LABS, Mat Res Dept, Nanosci African Network, POB 722, Cape Town, South AfricaUniv Zululand, Dept Phys & Engn, ZA-3886 Kwa Dlangezwa, South Africa
Matinise, N.
Ndlangamandla, C.
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Univ Zululand, Dept Phys & Engn, ZA-3886 Kwa Dlangezwa, South AfricaUniv Zululand, Dept Phys & Engn, ZA-3886 Kwa Dlangezwa, South Africa