Effect of developing solution flux on total pitch of black matrix in the pattern of color filters

Effect of developer flux on total pitch of resin black matrix in the pattern of color filters have been demonstrated and attain optimal process condition for fine patterns in color filters. From experimental results, characteristic diagram and Minitab analysis, one of major influence factors for total pitch of resin black matrix is developer flux and judge optimal developing condition. The variation of developer flux up to 60L/min can effectively control total pitch of resin black matrix in line width below 2 mu m.