Synthesis of silicon nanowires using tin catalyst by hot wire chemical vapor processing
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作者:
Meshram, Nagsen
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Indian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, India
Meshram, Nagsen
[1
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Kumbhar, Alka
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Indian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, India
Kumbhar, Alka
[1
]
Dusane, R. O.
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Indian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, India
Dusane, R. O.
[1
]
机构:
[1] Indian Inst Technol, Dept Met Engn & Mat Sci, Bombay 400076, Maharashtra, India
Silicon nanowires (SiNWs) have been synthesized at temperatures in the range 300-400 degrees C by the hot wire chemical vapor processing (HWCVP) using tin nanotemplate. The tin nano-template is formed by hot wire atomic hydrogen treatment of thermally evaporated Sn films (similar to 300 nm thick) on glass substrates. Silicon nanowires are then grown using hot wire induced dissociation of SiH4 gas over the nanotemplate. Growth conditions like growth time and temperature were varied to study their effect on the tin nanoparticle size and on the silicon nanowire dimensions thereafter. From the observations, it is clear that the nanowire diameters and lengths depend on the size of nanoparticles and the growth time respectively. Though SiNWs were observed to grow at temperatures as low as 300 degrees C, nanowires with a narrow diameter distribution were achieved at 400 degrees C. Raman spectra and transmission electron microscope (TEM) reveal the crystalline nature of the silicon nanowires. (C) 2013 Elsevier Ltd. All rights reserved.
机构:
Indian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Mumbai 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Mumbai 400076, Maharashtra, India
Arya, Nitin
Dusane, Rajiv
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Indian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Mumbai 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Mumbai 400076, Maharashtra, India
机构:Indian Institute of Technology Bombay,Semiconductor Thin Films and Plasma Processing Laboratory, Department of Metallurgical Engineering and Materials Science
Ankur Soam
Nitin Arya
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机构:Indian Institute of Technology Bombay,Semiconductor Thin Films and Plasma Processing Laboratory, Department of Metallurgical Engineering and Materials Science
Nitin Arya
Rajiv Dusane
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机构:Indian Institute of Technology Bombay,Semiconductor Thin Films and Plasma Processing Laboratory, Department of Metallurgical Engineering and Materials Science
机构:
Indian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, India
Meshram, Nagsen
Arya, Nitin
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Indian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, India
Arya, Nitin
Kumbhar, Alka
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机构:
Indian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, India
Kumbhar, Alka
Dusane, Rajiv
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机构:
Indian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, IndiaIndian Inst Technol, Dept Met Engn & Mat Sci, Semicond Thin Films & Plasma Proc Lab, Bombay 400076, Maharashtra, India
机构:
Univ Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, MalaysiaUniv Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, Malaysia
Chong, Su Kong
Goh, Boon Tong
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Univ Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, MalaysiaUniv Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, Malaysia
Goh, Boon Tong
Aspanut, Zarina
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Univ Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, MalaysiaUniv Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, Malaysia
Aspanut, Zarina
Muhamad, Muhamad Rasat
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Univ Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, MalaysiaUniv Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, Malaysia
Muhamad, Muhamad Rasat
Dee, Chang Fu
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Univ Kebangsaan Malaysia Univ Kebangsaan Malaysia, Inst Microengn & Nanoelect IMEN, Bangi, Selangor, MalaysiaUniv Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, Malaysia
Dee, Chang Fu
Rahman, Saadah Abdul
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Univ Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, MalaysiaUniv Malaya, Low Dimens Mat Res Ctr, Dept Phys, Kuala Lumpur 50603, Malaysia
机构:
Indian Inst Technol, Semicond Thin Films & Plasma Proc Lab, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, IndiaIndian Inst Technol, Semicond Thin Films & Plasma Proc Lab, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, India
Meshram, Nagsen P.
Kumbhar, Alka
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机构:
Indian Inst Technol, Semicond Thin Films & Plasma Proc Lab, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, IndiaIndian Inst Technol, Semicond Thin Films & Plasma Proc Lab, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, India
Kumbhar, Alka
Dusane, R. O.
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol, Semicond Thin Films & Plasma Proc Lab, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, IndiaIndian Inst Technol, Semicond Thin Films & Plasma Proc Lab, Dept Met Engn & Mat Sci, Mumbai 400076, Maharashtra, India