Quantitative determination of silicon in silica dust by FT-Raman spectroscopy

被引:7
|
作者
Phillips, DN
Suckling, TM
vanBronswijk, W
机构
[1] School of Applied Chemistry, Curtin University of Technology, Perth, WA 6001
关键词
silicon; silica dust; FT-Raman spectroscopy;
D O I
10.1016/0039-9140(95)01728-3
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Silicon was quantitatively determined in respirable silica dusts and silica fume by FT-Raman spectroscopy using barium sulfate as an internal standard. Barium sulfate was selected as the standard as its Raman spectrum does not overlap with that of silicon and its scattering cross-section is significantly lower. This allowed silicon admired with barium sulfate in ratios as low as 0.00003 to be detected. The laser beam was defocussed to cover the sample area. 128 scans at 4 cm(-1) resolution with 600 mW of power at the sample achieved a detection limit of 0.1 mu g of silicon in a 5 mg sample. Silicon to BaSO4 ratios in the range 0.00003-0.06 showed a near linear response with any decade change being linear. The RSD for this analytical method was +/-2%. Silica fume and respirable silica dust showed silicon concentrations to be in the range 2.6-51.5 ppm and 0.05-0.7 mg m(-3) respectively.
引用
收藏
页码:221 / 224
页数:4
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