Improved nickel silicide ohmic contacts to n-type 4H and 6H-SiC using nichrome

被引:7
|
作者
Luckowski, ED
Williams, JR
Bozack, MJ
IsaacsSmith, T
Crofton, J
机构
关键词
D O I
10.1557/PROC-423-119
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Results are reported for ohmic contacts formed on n-type 4H and 6H-SiC using nichrome (80/20 weight percent Ni/Cr). In comparison to contacts formed on 6H-SiC using pure Ni, the electrical characteristics of these NiCr contacts are similar (similar to 1E-5 Omega-cm(2) for moderately doped material), and composite Au/NiCr contacts exhibit good stability during long-term anneals (similar to 2500 hr) at 300 C without the requirement of a diffusion barrier layer between the ohmic contact layer and the Au cap layer. The use of NiCr also results in success rates near 100% for direct wire bonding to the Au cap layers.
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页码:119 / 124
页数:6
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