Metrology (including materials characterization) for nanoelectronics

被引:0
|
作者
Diebold, A. C. [1 ]
Price, J. [1 ]
Hung, P. Y. [1 ]
机构
[1] SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA
关键词
D O I
10.1117/12.661119
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Integrated circuits have already entered the world of nanoelectronics. According to the International Technology Roadmap for Semiconductors, the industry will be extending CMOS technology through new materials and device structures for at least the next fifteen years. During that time, the gate length of nanotransistors will shrink to less than 10 nm. The electrical properties of nano-transistors will move into regime of short channel devices where new physics will result in changes in transistor operation. The number of transistors in a single IC is already approaching a number that results 2 billion functions per IC by 2010. Nano-sized features and high density will challenge metrology and characterization and most certainly move measurement further into the world of nanotechnology. Beyond CMOS, new nano-technology based devices are being considered as a means of continuing the rapid pace of technological innovation in electronics.
引用
收藏
页码:U101 / U105
页数:5
相关论文
共 50 条
  • [1] Metrology (including materials characterization) for nanoelectronics
    Diebold, AC
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005, 2005, 788 : 21 - 32
  • [2] Characterization and metrology for nanoelectronics
    Diebold, Alain C.
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 20 - 33
  • [3] Survey of characterization and metrology for nanoelectronics
    Diebold, Alain C.
    2008 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 46TH ANNUAL, 2008, : 50 - 51
  • [4] Preface: Frontiers of Characterization and Metrology for Nanoelectronics: 2011
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2011, 2011, 1395
  • [5] Nanoelectronics: Metrology and computation
    Lundstrom, Mark
    Clark, Jason V.
    Klimeck, Gerhard
    Raman, Arvind
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 563 - +
  • [6] A review of metrology for nanoelectronics
    Galatsis, Kosmas
    Potok, Ron
    Wang, Kang L.
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2007, 20 (04) : 542 - 548
  • [7] Principles of Materials Characterization and Metrology
    Michael, Joseph R.
    JOURNAL OF MATERIALS SCIENCE, 2022, 57 (16) : 7763 - 7766
  • [8] Principles of materials characterization and metrology
    Harker, A. H.
    CONTEMPORARY PHYSICS, 2021, 62 (04) : 242 - 242
  • [9] Metrology for high-frequency nanoelectronics
    Wallis, T. Mitch
    Imtiaz, Atif
    Nembach, Hans T.
    Rice, Paul
    Kabos, Pavel
    FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007, 2007, 931 : 525 - +
  • [10] Guest editorial - Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
    Seiler, David G.
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2006, 19 (04) : 370 - 371