Nucleation and growth of nanocrystalline diamond on NaCl substrate by RF-PECVD

被引：1
|
作者：
Xu, Q. [1 ]
Yang, G. M. [2 ]
机构：
[1] Changchun Inst Technol, Changchun 130021, Peoples R China
[2] Changchun Normal Univ, Coll Phys, Changchun 130032, Jilin Province, Peoples R China
来源：
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 2013年 / 74卷 / 04期
基金：
中国国家自然科学基金;
关键词：
Crystal (diamond); Plasma deposition; PRESSURE; CARBON; PHASE; DIAGRAM;
D O I：
10.1016/j.jpcs.2012.11.014
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Nanocrystalline diamond (NCD) was synthesized on the NaCl(100) substrate by using plasma enhanced chemical vapor deposition (PECVD). Combining our recent work on synthesizing microcrystalline diamond (MCD) and NCD on Si substrates, the nucleation and growth mechanisms for synthesizing MCD and NCD were investigated. Our findings are that surface stress, substrates, electrostatic attraction, substrate pre-treatment methods, and hydrogen in discharging gases play crucial roles in the nucleation and growth of NCD and MCD. (C) 2012 Elsevier Ltd. All rights reserved.
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页码：541 / 544
页数：4
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