Mass spectrum analysis of gas emitted during organic contaminant removal from a metal surface with an arc in low vacuum

被引：0
|
作者：
Sugimoto, Masaya [1 ]
Takeda, Koichi [1 ]
机构：
[1] Akita Prefectural Univ, Fac Syst Sci & Technol, 84-4 Tsuchiya Ebinokuchi, Akita 0150055, Japan
来源：
FLOW DYNAMICS | 2006年 / 832卷
关键词：
arc in low vacuum; metal surface cleaning; organic contaminant; mass spectrum analysis; quadrupole mass spectrometer;
D O I：
暂无
中图分类号：
O414.1 [热力学];
学科分类号：
摘要：
The gas emitted during organic contaminant removal from a metal surface with an arc in low vacuum is investigated using a quadrupole mass spectrometer. The experimental results show that fragment molecules of the contaminant material, which are created by the decomposition of the contaminant material, exist in the emitted gas. The decomposition rate of the contaminant increased with the treatment current, which indicates that the decomposition occurs not in the cathode spot, but in the are column.
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页码：397 / +
页数：2
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