Olefin metathesis catalyst .3. Angle-resolved XPS and depth profiling study of a tungsten oxide layer on silica

被引:16
|
作者
Verpoort, F [1 ]
Bossuyt, AR [1 ]
Verdonck, L [1 ]
机构
[1] STATE UNIV GHENT,DEPT INORGAN & PHYS CHEM,ORGANOMET & CATALYSIS DIV,B-9000 GHENT,BELGIUM
关键词
angle-resolved X-ray photoelectron spectroscopy; catalyst; depth profiling; WOx/SiO2/Si (100); X-ray photoelectron spectroscopy;
D O I
10.1016/S0368-2048(96)03058-7
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Model supports consisting of a thin layer of SiO2 on a Silicon single crystal have been used to study the [W](n+)/SiO2/Si (100) model catalyst precursor prepared by a controlled reaction of pi-C5H5W(CO)(3)Cl with the SiO2 surface. Characterization of the tungsten surface species has been performed by combination of conventional, angle-resolved and depth-profiling X-ray photoelectron spectroscopy (XPS). The silica surface consists of highly dispersed W-oxide units linked by two Si-O-W bonds. Further, compared with the powder analogues, a drastic increase in spectral resolution and detailed band structure is observed in the XPS spectra.
引用
收藏
页码:151 / 163
页数:13
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