Atomic jumps in surface self-diffusion: W on W(110)

被引:14
|
作者
Oh, SM [1 ]
Kyuno, K
Koh, SJ
Ehrlich, G
机构
[1] Univ Illinois, Mat Res Lab, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[3] Univ Tokyo, Dept Mat Engn, Tokyo 1138656, Japan
关键词
D O I
10.1103/PhysRevB.66.233406
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Although surface diffusion has been studied on the atomic level for decades, little is known about jump processes in self-diffusion. The diffusion of W atoms on the densely packed W(110) plane has therefore been examined, using the field ion microscope to probe contributions of jumps other than between nearest-neighbor sites. Measurements of the mean-square displacements of atoms along the x and y axes (<001> and <110>, respectively) and of the detailed spatial distribution of atomic displacements serve to define the nature of the jumps important in diffusion. It is shown that, in addition to nearest-neighbor and second-nearest-neighbor transitions along the close-packed <111>, atoms also carry out jumps along <001> and <110>, and that the contribution from these processes increases rapidly with temperature.
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页码:1 / 4
页数:4
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