Neural network modeling of growth processes

被引:11
|
作者
Venkateswaran, S [1 ]
Rai, MM [1 ]
Govindan, TR [1 ]
Meyyappan, M [1 ]
机构
[1] NASA, Ames Res Ctr, Moffett Field, CA 94035 USA
关键词
D O I
10.1149/1.1430721
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Process control based on physics-based modeling requires detailed real-time reactor simulations, which are currently not realistic. For such process control models to be feasible, information from reactor simulations must therefore be represented in a compact model. In this paper, we have developed a neural network based model for chemical vapor deposition. Detailed reactor simulations are used to train the neural network and the network predictions are then validated by additional simulations. We show that the current model is capable of accurately representing the process parameter space, thereby enabling use of the trained network for process control and design. (C) 2002 The Electrochemical Society.
引用
收藏
页码:G137 / G142
页数:6
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