The annealed low alloy 4140 steel samples have been nitrided for different treatment periods (1-6 h) in an RF inductive plasma discharge with very low bias voltage (approximate to 400 V). The resulting nitrided layer has been observed by means of an optical microscope whereas the nitride phases have been characterised by X-ray analysis. The corrosion response, assessed by the potentio dynamic tests in the 3.5% NaCl solution, presents both higher noble potential values and lower corrosion rates when compared with the untreated sample. The Vickers microhardness tests values show an appreciable increment compared to that of the untreated sample. The process is characterized by a high overall efficiency because similar average Vickers tests values were obtained, no matter for how long the treatment was extended. Likewise, the scanning electron micrographs confirmed no appreciable size evolution of the compound layer microstructure at different times of treatment.
机构:
Natl Inst Ind Technol, Mech Res & Dev Ctr, Buenos Aires, DF, ArgentinaNatl Inst Ind Technol, Mech Res & Dev Ctr, Buenos Aires, DF, Argentina
Dutrey, Luciano
De Las Heras, Evangelina
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Natl Inst Ind Technol, Mech Res & Dev Ctr, Buenos Aires, DF, ArgentinaNatl Inst Ind Technol, Mech Res & Dev Ctr, Buenos Aires, DF, Argentina
De Las Heras, Evangelina
Svoboda, Hernan G.
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Univ Buenos Aires, Fac Engn, CONICET, INTECIN,Mat & Struct Lab, RA-1427 Buenos Aires, DF, ArgentinaNatl Inst Ind Technol, Mech Res & Dev Ctr, Buenos Aires, DF, Argentina
Svoboda, Hernan G.
Corengia, Pablo A.
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Fdn INASMET Tecnalia, E-20009 Donostia San Sebastian, Guipuzcoa, SpainNatl Inst Ind Technol, Mech Res & Dev Ctr, Buenos Aires, DF, Argentina
机构:
Indian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, IndiaIndian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
Basu, A.
Majumdar, J. Dutta
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Indian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, IndiaIndian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
Majumdar, J. Dutta
Alphonsa, J.
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GIDC Elect Estate, FCIPT, Inst Plasma Res, Gandhinagar 382044, Gujarat, IndiaIndian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
Alphonsa, J.
Mukherjee, S.
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GIDC Elect Estate, FCIPT, Inst Plasma Res, Gandhinagar 382044, Gujarat, IndiaIndian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
Mukherjee, S.
Manna, I.
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Indian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, IndiaIndian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
机构:
Changzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R ChinaChangzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China
Wu, Jiqiang
Liu, Han
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Changzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China
Changzhou Univ, Jiangsu Collaborat Innovat Ctr Photovolat Sci & E, Changzhou 213164, Peoples R ChinaChangzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China
Liu, Han
Li, Jingcai
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Changzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R ChinaChangzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China
Li, Jingcai
Yang, Xingmei
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Changzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R ChinaChangzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China
Yang, Xingmei
Hu, Jing
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Changzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China
Auburn Univ, Mat Res & Educ Ctr, Auburn, AL 36849 USA
Changzhou Univ, Jiangsu Collaborat Innovat Ctr Photovolat Sci & E, Changzhou 213164, Peoples R ChinaChangzhou Univ, Jiangsu Key Lab Mat Surface Sci & Technol, Changzhou 213164, Peoples R China