A novel environmentally-friendly corrosion-free post-stripping rinsing procedure after solvent strip

被引：0

作者：

Vos, R

Rotondaro, A

Mertens, PW

Meuris, M

Heyns, M

机构：

来源：

1997 SYMPOSIUM ON VLSI TECHNOLOGY: DIGEST OF TECHNICAL PAPERS | 1997年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Corrosion of metal lines during the past-stripping rinse is a severe problem in multi-level metallization processes. In this paper it is demonstrated that the addition of small amounts of the inorganic acid HNO3 to the ultrapure water used for rinsing can effectively be used to suppress this corrosion without the need of an additional IPA-step.

引用

页码：37 / 38

页数：2