Characteristics of brush plated ZnTe thin films

被引：6
|
作者：
Murali, K [1 ]
Ziaudeen, M [1 ]
Jayaprakash, N [1 ]
机构：
[1] Cent Electrochem Res Inst, Karaikkudi 630006, Tamil Nadu, India
来源：
JOURNAL OF MATERIALS SCIENCE | 2006年 / 41卷 / 07期
关键词：
D O I：
10.1007/s10853-006-4434-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Zinc telluride thin films were deposited by the brush plating technique at a potential of -0.90 V (SCE) on conducting glass and titanium substrates at different temperatures in the range 30-90 degrees C. The films were polycrystalline in nature with peaks corresponding to the cubic phase. Direct band gap of 2.30 eV was observed. XPS studiers indicated the formation of ZnTe. Depth profiling studies indicated a uniform distribution of Zn and Te throughout the entire thickness. EDAX measurements were made on the films and it was found that there was a slight excess of Te. (c) 2006 Springer Science + Business Media, Inc.
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收藏
页码：1887 / 1892
页数：6
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