Reflection second harmonic generation scanning microscope

被引:6
|
作者
Martin, G [1 ]
Toussaere, E [1 ]
Soulier, L [1 ]
Zyss, J [1 ]
机构
[1] ENS Cachan, Lab Photon Quant & Mol, F-94235 Cachan, France
关键词
second harmonic generation; non linear microscopy; electrooptic polymers;
D O I
10.1016/S0379-6779(01)00609-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a simple microscopy set-up towards the spatial mapping of second harmonic generation of non-linear structures. The sample surface is scanned through a microscope objective by an off-axis incident nanosecond Nd:YAG fundamental laser beam. The incident fundamental and reflected harmonic beams are collected by the same objective, which allows a close scan of the surface by using high amplification objectives. The scan of different organic material-based structures will be presented, showing a second harmonic intensity cartography of active materials like oriented DR1-PMMA electrooptic polymer and MNA crystals, with micron-scale resolution. This simple set-up provides a useful and compact tool to characterize non-linear active domains, in order to gain insight on materials as well as on functional properties of different polymer-based structures. Moreover, with appropriate selection of incident and reflected polarization states, different components of the d(ijk) tensor can be singled-out and lead to microscopic information on molecular organization and local variations. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:105 / 109
页数:5
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