The MoS2-Graphene-Sapphire Heterostructure: Influence of Substrate Properties on the MoS2 Band Structure

被引:1
|
作者
Woerdenweber, Henrik [1 ,2 ,3 ]
Grundmann, Annika [4 ]
Wang, Zhaodong [1 ,2 ,5 ]
Hoffmann-Eifert, Susanne [5 ]
Kalisch, Holger [4 ]
Vescan, Andrei [4 ]
Heuken, Michael [4 ,6 ]
Waser, Rainer [1 ,2 ,5 ,7 ]
Karthaeuser, Silvia [1 ,2 ]
机构
[1] Forschungszentrum Julich, Peter Gruunberg Inst 7, D-52425 Julich, Germany
[2] JARA FIT, D-52425 Julich, Germany
[3] Rhein Westfal TH Aachen, D-52056 Aachen, Germany
[4] Rhein Westfal TH Aachen, Cpd Semicond Technol, D-52074 Aachen, Germany
[5] Forschungszentrum Julich, JARA Inst Energy efficient Informat Technol Green, D-52425 Julich, Germany
[6] AIXTRON SE, D-52134 Herzogenrath, Germany
[7] Rhein Westfal TH Aachen, Inst Mat Elect Engn & Informat Technol 2, D-52074 Aachen, Germany
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2023年 / 127卷 / 22期
关键词
MONOLAYER; GRAPHENE; RAMAN; PHOTOLUMINESCENCE; SPECTROSCOPY; ENERGY; FILMS;
D O I
10.1021/acs.jpcc.3c02503
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Van der Waals MoS2/graphene heterostructuresare promisingcandidates for advanced electronics and optoelectronics beyond graphene.Herein, scanning probe methods and Raman spectroscopy were appliedfor analysis of the electronic and structural properties of monolayer(ML) and bilayer 2H-MoS2 deposited on single-layer graphene(SLG)-coated sapphire (S) substrates by means of an industrially scalablemetal organic chemical vapor deposition process. The SLG/S substrateshows two regions with distinctly different morphology and variedinterfacial coupling between SLG and S. ML MoS2 nanosheetsgrown on the almost free-standing graphene show no detectable interfacecoupling to the substrate, and a value of 2.23 eV for the MoS2 quasiparticle bandgap is determined. However, if the grapheneis involved in hydrogen bonds to the hydroxylated sapphire surface,an increased MoS2/graphene interlayer coupling results,marked by a shift of the conduction band edge toward Fermi energyand a reduction of the ML MoS2 quasiparticle bandgap to1.98 eV. The surface topography reveals a buckle structure of ML MoS2 in conformity with SLG that is used to determine the dependenceof the ML MoS2 bandgap on the interfacial spacing of thisheterostructure. In addition, an in-gap acceptor state about 0.9 eVabove the valence band minimum of MoS2 has been observedon locally elevated positions on both SLG/S regions, which is attributedto local bending strain in the grown MoS2 nanosheets. Thesefundamental insights reveal the impact of the underlying substrateon the topography and the band alignment of the ML MoS2/SLG heterostructure and provide the possibility for engineeringthe quasiparticle bandgap of ML MoS2/SLG grown on controlledsubstrates that may impact the performance of electronic and optoelectronicdevices therewith.
引用
收藏
页码:10878 / 10887
页数:10
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