Simulation of a multichannel vacuum transistor with high cut-off frequency

被引:0
|
作者
Shen, Zhihua [1 ]
Wang, Xiao [2 ]
Ge, Bin [1 ]
Wu, Shengli [3 ]
Tian, Jinshou [4 ]
机构
[1] Nantong Vocat Univ, Sch Elect & Informat Engn, Nantong 226007, Peoples R China
[2] Shaanxi Univ Sci & Technol, Sch Elect Informat & Artificial Intelligence, Xian 710049, Peoples R China
[3] Xi An Jiao Tong Univ, Key Lab Phys Elect & Devices, Minist Educ, Xian 710049, Peoples R China
[4] Xian Inst Opt & Precis Mech CAS, State Key Lab Transient Opt & Photon, Xian 710119, Peoples R China
来源
基金
中国国家自然科学基金;
关键词
ATOMIC LAYER DEPOSITION; FIELD; DIODE;
D O I
10.1116/6.0002675
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A multichannel vertical vacuum transistor based on the Fowler-Nordheim tunneling emission mechanism was proposed and numerically investigated. The multichannel structure was demonstrated to be effective in enhancing the drain current when compared to the traditional single-channel structure with the same device size. For example, transconductance increased from 0.42 mS of the single-channel structure to 0.86 mS of the four-channel structure. In addition, when the vacuum channel number increases, the size of a single channel decreases correspondingly, leading to a reduction in electric field intensity on the electron emission surface. Thus, the off-state current dramatically reduced by two orders of magnitude reaching10(-15) A according to the simulated results. In other words, the ON/OFF drain current ratio of the multichannel structure is significantly enhanced. Furthermore, the simulation results indicate that the cut-off frequency of the multichannel device is 33% higher than that of the traditional single-channel one reaching 0.19 THz.
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页数:5
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