Ultrathin Crystalline Silicon Nano and Micro Membranes with High Areal Density for Low-Cost Flexible Electronics

被引:12
|
作者
Lee, Ju Young [1 ]
Shin, Jongwoon [1 ]
Kim, Kyubeen [1 ]
Ju, Jeong Eun [1 ]
Dutta, Ankan [2 ]
Kim, Tae Soo [1 ,3 ]
Cho, Young Uk [1 ]
Kim, Taemin [1 ]
Hu, Luhing [1 ]
Min, Won Kyung
Jung, Hyun-Suh [4 ]
Park, Young Sun [4 ]
Won, Sang Min [5 ]
Yeo, Woon-Hong [6 ,7 ,8 ,9 ]
Moon, Jooho [4 ]
Khang, Dahl-Young [4 ]
Kim, Hyun Jae [1 ]
Ahn, Jong-Hyun [1 ]
Cheng, Huanyu [2 ,10 ,11 ]
Yu, Ki Jun [1 ,12 ]
Rogers, John A. [13 ,14 ,15 ,16 ]
机构
[1] Yonsei Univ, Sch Elect & Elect Engn, 50 Yonsei Ro, Seodaemungu, Seoul 03722, South Korea
[2] Penn State Univ, Dept Engn Sci & Mech, University Pk, PA 16802 USA
[3] Postsilicon Semicond Inst, Korea Inst Sci & Technol KIST, Ctr Optoelect Mat & Devices, Seoul 02792, South Korea
[4] Yonsei Univ, Dept Mat Sci & Engn, 50 Yonsei-ro, Seoul 03722, South Korea
[5] Sungkyunkwan Univ, Dept Elect & Comp Engn, Suwon 16419, South Korea
[6] Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
[7] Engn Inst Elect & Nanotechnol, Georgia Inst Technol, IEN Ctr Human Centr Interfaces, Atlanta, GA 30332 USA
[8] Georgia Inst Technol, Parker H Petit Inst Bioengn & Biosci, Wallace H Coulter Dept Biomed Engn, Atlanta, GA 30332 USA
[9] Georgia Inst Technol, Inst Mat, Inst Robot & Intelligent Machines, Neural Engn Ctr, Atlanta, GA 30332 USA
[10] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
[11] Penn State Univ, Mat Res Inst, University Pk, PA 16802 USA
[12] Yonsei Univ, YU Korea Inst Sci & Technol KIST Inst, 50 Yonsei Ro, Seoul 03722, South Korea
[13] Northwestern Univ, Querrey Simpson Inst Bioelect, Evanston, IL 60208 USA
[14] Northwestern Univ, Dept Biomed Engn, Evanston, IL 60208 USA
[15] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[16] Northwestern Univ Feinberg Sch Med, Dept Neurol Surg, Chicago, IL 60611 USA
基金
新加坡国家研究基金会;
关键词
flexible electronics; reusable silicon; semiconductor electronics applications; silicon nano; micro membrane sheet transfer; THIN-FILM TRANSISTORS; SEMICONDUCTOR GROWTH; SOLAR-CELLS; OXIDE; SURFACE; ARRAYS; ORIENTATION; FABRICATION; CHALLENGES; INTERFACE;
D O I
10.1002/smll.202302597
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Ultrathin crystalline silicon is widely used as an active material for high-performance, flexible, and stretchable electronics, from simple passive and active components to complex integrated circuits, due to its excellent electrical and mechanical properties. However, in contrast to conventional silicon wafer-based devices, ultrathin crystalline silicon-based electronics require an expensive and rather complicated fabrication process. Although silicon-on-insulator (SOI) wafers are commonly used to obtain a single layer of crystalline silicon, they are costly and difficult to process. Therefore, as an alternative to SOI wafers-based thin layers, here, a simple transfer method is proposed for printing ultrathin multiple crystalline silicon sheets with thicknesses between 300 nm to 13 mu m and high areal density (>90%) from a single mother wafer. Theoretically, the silicon nano/micro membrane can be generated until the mother wafer is completely consumed. In addition, the electronic applications of silicon membranes are successfully demonstrated through the fabrication of a flexible solar cell and flexible NMOS transistor arrays.
引用
收藏
页数:12
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