Utilization of Nickel ferrite (NiFe2O4) in Hematite (α-Fe2O3) Photoanode for Photoelectrochemical Water Splitting as a Blocking Layer

被引:0
|
作者
Lee, Na Kyung [1 ]
Sohn, Woon Yong [1 ]
机构
[1] Chungbuk Natl Univ, Dept Chem, 1 Chungdae Ro, Cheongju 28644, Chungbuk, South Korea
基金
新加坡国家研究基金会;
关键词
Hematite (alpha-Fe2O3); Blocking layer; Nickel ferrite (NiFe2O4); Nickel iron oxide (NiFeOx); Back recombination; CHARGE-CARRIER KINETICS; THIN-FILM; EFFICIENT ELECTROCATALYST; ELECTRON-BLOCKING; SURFACE-STATES; IRON-OXIDE; RECOMBINATION; TIO2; DYNAMICS; ENHANCEMENT;
D O I
10.1002/cptc.202300301
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We found a new blocking layer (nickel ferrite, NiFe2O4), that could be utilized for the suppression of the back recombination, occurring in the hematite (alpha-Fe2O3) photoanode. The photoanode in which the NiFe2O4 layer was introduced showed a cathodic shift of the onset potential in the current density versus applied voltage curve. We successfully demonstrated that the NiFe2O4 layer effectively inhibited the back recombination in the hematite film through the use of electrochemical and time-resolved spectroscopic methods.
引用
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页数:7
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