Speed and reliability of magnetic domain wall (DW) motion are key parameters that must be controlled to realize the full potential of DW-based magnetic devices for logic and memory applications. A major hindrance to this is extrinsic DW pinning at specific sites related to shape and material defects, which may be present even if the sample synthesis is well controlled. Understanding the origin of DW pinning and reducing it are especially desirable in electrochemically deposited cylindrical magnetic nanowires (NWs), for which measurements of the fascinating physics predicted by theoretical computation have been inhibited by significant pinning. We experimentally investigate DW pinning in CoxNi100- x NWs by applying quasi-static magnetic fields. Wire compositions were varied with x = 20, 30, and 40, while the microstructure was changed by annealing or by varying the pH of the electrolyte for deposition. We conclude that pinning due to grain boundaries is the dominant mechanism, decreasing inversely with both the spontaneous magnetization and grain size. Second-order effects include inhomogeneities in lattice strain and the residual magnetocrystalline anisotropy. Surface roughness, dislocations, and impurities are not expected to play a significant role in DW pinning in these wire samples.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Bran, C.
Fernandez-Roldan, J. A.
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Helmholtz Zentrum Dresden Rossendorf eV, Inst Ion Beam Phys & Mat Res, Bautzner Landstr 400, D-01328 Dresden, GermanyCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Fernandez-Roldan, J. A.
Moreno, J. A.
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King Abdullah Univ Sci & Technol, Comp Elect & Math Sci & Engn, Thuwal 239556900, Saudi ArabiaCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Moreno, J. A.
Fraile Rodriguez, A.
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Univ Barcelona, Dept Fis Mat Condensada, Barcelona 08028, Spain
Univ Barcelona, Inst Nanociencia & Nanotecnol IN2UB, Barcelona 08028, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Fraile Rodriguez, A.
del Real, R. P.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
del Real, R. P.
Asenjo, A.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Asenjo, A.
Saugar, E.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Saugar, E.
Marques-Marchan, J.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Marques-Marchan, J.
Mohammed, H.
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King Abdullah Univ Sci & Technol, Comp Elect & Math Sci & Engn, Thuwal 239556900, Saudi ArabiaCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Mohammed, H.
Foerster, M.
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ALBA Synchrotron Light Facil, CELLS, Barcelona 08290, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Foerster, M.
Aballe, L.
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ALBA Synchrotron Light Facil, CELLS, Barcelona 08290, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Aballe, L.
Kosel, J.
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King Abdullah Univ Sci & Technol, Comp Elect & Math Sci & Engn, Thuwal 239556900, Saudi Arabia
Silicon Austria Labs, A-9524 Villach, AustriaCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Kosel, J.
Vazquez, M.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
Vazquez, M.
Chubykalo-Fesenko, O.
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CSIC, Inst Ciencia Mat Madrid, Madrid 28049, SpainCSIC, Inst Ciencia Mat Madrid, Madrid 28049, Spain
机构:Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
Yuan, H. Y.
Wang, X. R.
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Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R ChinaHong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China