On the Quenching of Electron Temperature in Inductively Coupled Plasma

被引:1
|
作者
Seong, Inho [1 ]
Kim, Si-jun [1 ,2 ]
Lee, Youngseok [1 ,2 ]
Cho, Chulhee [1 ]
Jeong, Wonnyoung [1 ]
You, Yebin [1 ]
Choi, Minsu [1 ]
Choi, Byeongyeop [1 ]
You, Shinjae [1 ,2 ]
机构
[1] Chungnam Natl Univ, Dept Phys, Appl Phys Lab PLasma Engn APPLE, Daejeon 34134, South Korea
[2] Chungnam Natl Univ, Inst Quantum Syst IQS, Daejeon 34134, South Korea
基金
新加坡国家研究基金会;
关键词
plasma diagnostics; electron temperature; electron temperature quenching; skin effect;
D O I
10.3390/ma16083219
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electron temperature has attracted great attention in plasma processing, as it dominates the production of chemical species and energetic ions that impact the processing. Despite having been studied for several decades, the mechanism behind the quenching of electron temperature with increasing discharge power has not been fully understood. In this work, we investigated the quenching of electron temperature in an inductively coupled plasma source using Langmuir probe diagnostics, and suggested a quenching mechanism based on the skin effect of electromagnetic waves within local- and non-local kinetic regimes. This finding provides insight into the quenching mechanism and has implications for controlling electron temperature, thereby enabling efficient plasma material processing.
引用
收藏
页数:9
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