A Comparative Investigation of an Argon Dielectric Barrier Discharge Reactor under the Variation of Plasma Conditions for Optimization of Power Deposition

被引:0
|
作者
Poorreza, E. [1 ]
Vafaie, R. Hadjiaghaie [2 ]
机构
[1] Sahand Univ Technol, Fac Elect Engn, Tabriz, Iran
[2] Univ Bonab, Fac Elect Engn, Bonab, Iran
关键词
plasma reactor; dielectric barrier discharge; plasma chemistry; power deposition; finite element method; discharge gap; INACTIVATION; SIMULATION; ATOMS; JET;
D O I
10.1134/S0040579523330059
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
Gas discharges in the plasma atmosphere are known to consist of a collection of different particles, mainly electrons, ions, neutral atoms, and molecules. The present need is to characterize the plasmas and optimization of the designed plasma system under variable conditions. In this work, a time-dependent, one-dimensional simulation of an optimized DBD device, driven by a sinusoidal alternating high voltage, in argon gas is demonstrated. First of all, a DBD device with two electrodes, covered by the dielectric and with the variable discharge gap was assumed, and the discharge parameters were simulated versus time across the plasma gap. A comparison between the results is carried out. In the second part, with a fixed gap that was obtained from previous section, when the dielectric thickness changed, the plasma parameters were simulated. In the third case, with a fixed discharge gap and dielectric thickness, the plate diameters were varied and the best diameter was selected to deliver the best power deposition. Finally, the operating frequency and voltage were varied and the optimized values were obtained. Time-dependent and 1D profiles of the electric field, electron density, electron temperature, ion current density, electron current density, plasma, total current, and power deposition are demonstrated.
引用
收藏
页码:1552 / 1571
页数:20
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