Atomistic models of In and Ga diffusion in Cu(In,Ga)Se2

被引:2
|
作者
Gehrke, Aaron S. [1 ]
Sommer, David E. [2 ]
Dunham, Scott T. [3 ]
机构
[1] Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98195 USA
[2] Univ Washington, Dept Phys, Washington, DC 98195 USA
[3] Univ Washington, Dept Elect Engn, Washington, DC 98195 USA
关键词
GRAIN-BOUNDARIES; CUINSE2; DEFECTS; CUGASE2; GALLIUM;
D O I
10.1063/5.0160330
中图分类号
O59 [应用物理学];
学科分类号
摘要
To improve the performance of Cu(In,Ga)Se-2 thin-film photovoltaic devices, a robust understanding of the dominant diffusion pathways of the alloy species In and Ga is needed. Here, the most probable defect complexes and mechanisms for In and Ga diffusion are identified with the aid of density functional theory. The binding energies and migration barriers for these complexes are calculated in bulk CuInSe2 and CuGaSe2. Analytic models and kinetic lattice Monte Carlo simulations are employed to predict the diffusivity of In and Ga under variations in composition and temperature. We find that a model based on coulombic interactions between group III antisites and vacancies on the Cu-sublattice produces results that match well with experiment.
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页数:13
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