High-throughput study of the effect of indium on the microstructure and properties of copper alloy

被引:2
|
作者
Dai, Jiaoyan [1 ]
Liu, Chengpeng [2 ]
Fan, Shuaiqi [3 ]
Ye, Xiang-Xi [2 ]
机构
[1] Ningbo Univ Technol, Sch Mat & Chem Engn, Ningbo 315211, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Appl Phys, 2019 Jialuo Rd, Shanghai 201800, Peoples R China
[3] Hua Hong Semicond Co Ltd Wuxi, Wuxi 214000, Peoples R China
关键词
Cu-xIn alloy; High throughput method; Synchrotron radiation X-ray; diffraction; Microstructure and performance; HIGH ELECTRICAL-CONDUCTIVITY; ELECTRONIC-PROPERTIES; MAGNETIC-PROPERTIES; HIGH-STRENGTH; CU; EVOLUTION; BEHAVIOR; CONTACT;
D O I
10.1016/j.jmrt.2023.10.066
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, the high throughput sample of Cu-xIn (x = 0-5 wt.%) alloy was prepared by the spark plasma sintering. The effects of In content on the microstructure and properties of Cu alloys were investigated using advanced characterization. The results show that the concentration of In element linearly distributes in Cu alloy after annealing treatment at 450 degrees C. Most In elements exist in the Cu matrix as the solid solution atoms. Some In elements are precipitated at the grain boundaries as Cu9In4 particles when the In content is higher. The hardness of the alloy increases, while the conductivity decreases with the increase of In content, which is due to the hindrance of the movement of dislocations and electrons by solid solution atoms, grain boundaries, and Cu9In4 particles. The investigation of high throughput samples can provide data support for high strength and high conductivity Cu alloys. (c) 2023 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).
引用
收藏
页码:2336 / 2345
页数:10
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