Application of X-rays to Interpret Intensity Ratios for Nickel in Nickel (II) Oxide

被引:0
|
作者
Koksal, O. K. [1 ,2 ]
Sogut, O. [3 ]
Kucukonder, E. [4 ]
Dagli, S. [5 ]
机构
[1] Adiyaman Univ, Dept Elect & Elect Engn, Fac Engn, TR-02040 Adiyaman, Turkiye
[2] Karadeniz Tech Univ, Dept Phys, Fac Sci, TR-61080 Trabzon, Turkiye
[3] Kahramanmaras Sutcu Imam Univ, Fac Sci & Letters, Dept Phys, TR-46100 Kahramanmaras, Turkiye
[4] Kahramanmaras Sutcu Imam Univ, Vocat Sch Tech Sci, Dept Mat & Mat Proc Technol, TR-46100 Kahramanmas, Turkiye
[5] Ibni Sina Vocat Tech & Anatolian High Sch, TR-01250 Adana, Turkiye
关键词
VALENCE ELECTRONIC-STRUCTURE; FLUORESCENCE PARAMETERS; ELECTROCHROMIC PROPERTIES; ELEMENTS;
D O I
10.12693/APhysPolA.143.362
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The K-shell characteristic X-ray intensity ratios of nickel (II) oxide thin films generated by chemical spraying with 1-6 percent boron doping were studied. An americium-241 radioisotope source generated 59.543 kilo-electron volt gamma rays at 50 mili Curie intensity for these samples. The distinctive X-rays of the samples were calculated using a Canberra ultra-low energy germanium detector (with a resolution of 150 electron volts at 5.96 keV). The results were interpreted based on the amount of boron doped in nickel (II) oxide thin films, and it was discovered that, with the exception of boron doping quantities of 5 percent and 6 percent, K-shell X-ray intensity ratios rose as boron doping amounts increased. The findings are given and compared to those of the previous study. The obtained results are provided and compared in the table to the other researchers' theoretical and experimental results.
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页码:362 / 368
页数:7
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