Boosting Oxygen Evolution Performance of Nickel-Iron Layered Double Hydroxides by Controlling Oxygen Vacancies and Structural Disorder via n-Butyllithium Treatment

被引:0
|
作者
Chen, Xifan [1 ]
Zhang, Yameng [1 ]
Yang, Jia [1 ]
Xiao, Juan-ding [1 ]
Yang, Zhengkun [1 ]
Wang, Junzhong [1 ]
机构
[1] Anhui Univ, Inst Phys Sci & Informat Technol, Key Lab Struct & Funct Regulat Hybrid Mat, Minist Educ,Anhui Graphene Mat Res Ctr, Hefei 230601, Peoples R China
基金
中国国家自然科学基金;
关键词
MULTIPLE VACANCIES; NANOSHEETS; PHASE;
D O I
10.1021/acs.inorgchem.3c03457
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Nickel-iron-based layered double hydroxides (NiFe-LDHs) are promising catalysts for the oxygen evolution reaction (OER) because of their high activity, availability, and low cost. Defect engineering, particularly the formation of oxygen vacancies, can improve the catalytic activity of NiFe-LDHs. However, the controllable introduction of uniform oxygen vacancies remains challenging. Herein, an n-butyllithium treatment method is developed to tune oxygen vacancy defects and change the degree of amorphization in NiFe-LDHs via deep reduction, followed by partial oxidization at low temperatures. Interestingly, the Ni in the NiFe-LDHs is selectively reduced to the alloy state by n-butyllithium, whereas Fe is not. The different structural transformations of Ni and Fe during the treatment successfully produce an oxygen-defect-rich amorphous/crystalline electrocatalyst. Under optimal conditions, the treated NiFe-LDHs exhibit high OER activity with an overpotential of 223 mV at 10 mA cm(-2) (68 mV lower than that of a commercial IrO2 electrocatalyst) and long-term stability. Notably, the n-butyllithium treatment can be applied to other electrocatalysts, such as CoFe-LDHs and IrO2 (treated IrO2 with an overpotential of 197 mV at 10 mA cm(-2)). This n-butyllithium reduction/partial oxidization treatment constitutes a novel top-down strategy for the controllable modification of metal oxide structures, with various energy-related applications.
引用
收藏
页码:19795 / 19803
页数:9
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