Enhanced Thermoelectric Performance of a HfS2 Bilayer by Strain Engineering

被引:5
|
作者
Wang, Hao [1 ]
Xiang, Juan [1 ]
Dai, Bo [1 ]
Ge, Ni-Na [1 ]
Zhang, Xiao-Wei [1 ]
Ji, Guang-Fu [2 ]
机构
[1] Southwest Univ Sci & Technol, State Key Lab Environm Friendly Energy Mat, Mianyang 621010, Peoples R China
[2] China Acad Engn Phys, Inst Fluid Phys, Lab Shock Wave & Detonat Phys Res, Mianyang 621900, Peoples R China
基金
中国国家自然科学基金;
关键词
Thermoelectric properties; lattice strain; first-principles calculations; HfS2; bilayer; ZT value; BULK; MONO; ZR;
D O I
10.1007/s11664-023-10443-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For two-dimensional transition metal dichalcogenides, the thermoelectric properties of the material are affected by layer thickness and lattice strain. In this paper, we investigate the thermoelectric properties of a HfS2 bilayer under different biaxial tensile strains by first-principles calculations combined with Boltzmann equations. The presence of degenerate bands in the HfS2 bilayer and the absence of its monolayer results in the better thermoelectric performance of the HfS2 bilayer than its monolayer. Moreover, this strain increases the band degeneracy of the HfS2 bilayer even more, and the degenerate bands and stepped 2D density of states lead to a high power factor. In addition, the lattice strain increases the phonon scattering rate and reduces the phonon lifetime of the HfS2 bilayer, resulting in a decrease in the lattice thermal conductivity. Ultimately, we obtained a maximum ZT value of 1.76 for the unstrained HfS2 bilayer at the optimal doping concentration. At this time, its power factor and thermal conductivity are 53.01 mW/mK(2) and 9.06 W/mK, respectively. When the strain reaches 3%, for the n-type doped HfS2 bilayer, the power factor and thermal conductivity are 69.87 mW/mK(2) and 6.36 W/mK, respectively, and the maximum ZT value is 3.29. For the p-type doped HfS2 bilayer, the maximum ZT value appears at 6% strain, which is 1.83, at which the power factor and thermal conductivity are 13.81 mW/mK(2) and 2.27 W/mK, respectively.
引用
收藏
页码:6537 / 6550
页数:14
相关论文
共 50 条
  • [1] Enhanced Thermoelectric Performance of a HfS2 Bilayer by Strain Engineering
    Hao Wang
    Juan Xiang
    Bo Dai
    Ni-Na Ge
    Xiao-Wei Zhang
    Guang-Fu Ji
    Journal of Electronic Materials, 2023, 52 : 6537 - 6550
  • [2] Improved Thermoelectric Performance of Monolayer HfS2 by Strain Engineering
    Wang, Hao
    Lan, Yang-Shun
    Dai, Bo
    Zhang, Xiao-Wei
    Wang, Zhi-Guo
    Ge, Ni-Na
    ACS OMEGA, 2021, 6 (44): : 29820 - 29829
  • [3] Enhanced Optoelectronic and Thermoelectric Properties by Intrinsic Structural Defects in Monolayer HfS2
    Singh, Deobrat
    Ahuja, Rajeev
    ACS APPLIED ENERGY MATERIALS, 2019, 2 (09) : 6891 - 6903
  • [4] Adjustable electronic properties of PtSe2/HfS2 heterostructures via strain engineering
    Meng, Lingyu
    Peng, Junhao
    Dong, Huafeng
    Wen, Minru
    Wu, Fugen
    Applied Surface Science, 2022, 606
  • [5] Adjustable electronic properties of PtSe2/HfS2 heterostructures via strain engineering
    Meng, Lingyu
    Peng, Junhao
    Dong, Huafeng
    Wen, Minru
    Wu, Fugen
    APPLIED SURFACE SCIENCE, 2022, 606
  • [6] HfS2/MoTe2 vdW heterostructure: bandstructure and strain engineering based on first-principles calculation
    Yang, Xinge
    Qin, Xiande
    Luo, Junxuan
    Abbas, Nadeem
    Tang, Jiaoning
    Li, Yu
    Gu, Kunming
    RSC ADVANCES, 2020, 10 (05) : 2615 - 2623
  • [7] Exploring electronic characteristics of bilayer HfS2 under mechanical strain and external electric field: A first-principles approach
    Bao, Jinlin
    Liu, Guili
    Yang, Lu
    Li, Feng
    Yang, Zhonghua
    Zhang, Guoying
    CHINESE JOURNAL OF PHYSICS, 2024, 89 : 1415 - 1430
  • [8] Ferromagnetic properties of Mn-doped HfS2 monolayer under strain
    Ma, Xu
    Zhao, Xu
    Wu, Ninghua
    Xin, Qianqian
    Liu, Xiaomeng
    Wang, Tianxing
    Wei, Shuyi
    SOLID STATE COMMUNICATIONS, 2017, 268 : 15 - 19
  • [9] Mitigating Tunneling Leakage in Ultrascaled HfS2 pMOS Devices With Uniaxial Strain
    Kaniselvan, Manasa
    Sritharan, Mayuri
    Yoon, Youngki
    IEEE ELECTRON DEVICE LETTERS, 2022, 43 (07) : 1133 - 1136
  • [10] Superconductivity in HfS2 at ultrahigh pressure
    Zhang, Shihui
    Wang, Hailun
    Liu, Hao
    Zhen, Jiapeng
    Wan, Shun
    Deng, Wen
    Han, Yonghao
    Chen, Bin
    Gao, Chunxiao
    PHYSICAL REVIEW MATERIALS, 2023, 7 (10)