Study of the defect chemistry in Ag2Q (Q = S, Se, Te) by first-principles calculations

被引:15
|
作者
Wuliji, Hexige [1 ]
Zhao, Kunpeng [1 ]
Cai, Xiaomeng [2 ]
Jing, Huirong [2 ]
Wang, Yaowei [2 ]
Huang, Haoran [1 ]
Wei, Tian-Ran [1 ]
Zhu, Hong [2 ]
Shi, Xun [1 ,3 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, State Key Lab Met Matrix Composites, Shanghai 200240, Peoples R China
[2] Shanghai Jiao Tong Univ, Univ Michigan Shanghai Jiao Tong Univ Joint Inst, Shanghai 200240, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine M, Shanghai 200050, Peoples R China
基金
中国国家自然科学基金;
关键词
Thermoelectric; Silver chalcogenides; Defect chemistry; Doping; Interstitial; THERMOELECTRIC PERFORMANCE; FLEXIBLE THERMOELECTRICS; ENERGY-GAP; SILVER; SEMICONDUCTORS; TRANSITION;
D O I
10.1016/j.mtphys.2023.101129
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ag2Q-based (Q = S, Se, Te) silver chalcogenides show great potential in thermoelectrics due to their suitable band gaps, high electron mobilities, and even remarkable ductility. Particularly, Ag2S and Ag2S/Se/Te solid solutions have been reported with both good ductility and thermoelectric performance, which are extremely suitable for the application in flexible wearables. However, the underlying mechanism of the native n-type conduction and p-type undopability for Ag2Q remains elusive. Herein, we use first-principles calculations based on density functional theory combined with GW correction to investigate the defect chemistry in Ag2Q. It is found that the site potential and Voronoi volume deviations resulting from Ag interstitials are noticeably smaller than those caused by Ag vacancies, which makes Ag interstitials with low formation energy more desirable during preparation, contributing to the native n-type conduction. The small and even negative dopability win-dows, on the other hand, account for the p-type undopability of Ag2Q. The calculated carrier concentrations of pristine Ag2Q are well consistent with the experimental observations, validating the reliability of our defect calculations. This work provides valuable guidance for first-principles calculation of defect chemistry in other narrow-gap semiconductors.
引用
收藏
页数:9
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