Model predictive control of sputter processes

A new model is developed to approximate the multivariable nonlinear sputter process with respect to the argon gas flow and the generator power as the inputs and the argon pressure and the self-bias voltage as the outputs. The identification of the process parameters is discussed based on experimental data. A novel control strategy for sputter processes is presented that applies an offset-free predictive controller based on the approximated model. Experiments are shown to validate the control system.