The combination of a topological insulator and an antiferromagnet is expected to exhibit the quantum anomalous Hall effect due to the breaking of the time-reversal symmetry. As a layered antiferromagnet, CoNb3S6 was recently found to exhibit an anomalous Hall effect below the Ne ' el temperature (T-N = 29 K). Here, we report the controllable growth of Bi nanowires and Bi2Se3 thin films on CoNb3S6 substrates using molecular beam epitaxy. The composition and morphology of the as-prepared Bi nanowires and Bi2Se3 thin films were studied by atomic force microscopy, X-ray photoelectron spectroscopy, and scanning tunneling microscopy. We found that the as-grown Bi nanowires with abundant sizes are oriented along high-symmetry directions of the substrate, forming firework-like structures. Such firework-like structures of Bi nanowires exhibit a high edge-to-surface ratio as well as a strong anisotropy, highly desirable for photoelectric devices and industrial catalysts. The absence of oxidation peaks verifies that the asprepared samples are of high quality and air stability, very promising for applications.
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Korea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South KoreaKorea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South Korea
Park, Tae Gwan
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Na, Hong Ryeol
Chun, Seung-Hyun
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Sejong Univ, Dept Phys & Astron, Seoul 05006, South KoreaKorea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South Korea
Chun, Seung-Hyun
Cho, Won Bae
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Elect & Telecommun Res Inst ETRI, Welf & Med ICT Res Dept, Daejeon 34129, South KoreaKorea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South Korea
Cho, Won Bae
Lee, Sunghun
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Sejong Univ, Dept Phys & Astron, Seoul 05006, South KoreaKorea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South Korea
Lee, Sunghun
Rotermund, Fabian
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Korea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South KoreaKorea Adv Inst Sci & Technol KAIST, Dept Phys, Daejeon 34141, South Korea
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Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Yan, Haoming
Vajner, Cooper
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Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Vajner, Cooper
Kuhlman, Michael
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Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Kuhlman, Michael
Guo, Lingling
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Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Guo, Lingling
Li, Lin
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Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USA
Univ Alabama, Dept Met & Mat Engn, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Li, Lin
Araujo, Paulo T.
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Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USA
Univ Alabama, Dept Phys & Astron, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Araujo, Paulo T.
Wang, Hung-Ta
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Univ Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
Univ Alabama, Ctr Mat Informat Technol, MINT Ctr, Tuscaloosa, AL 35487 USAUniv Alabama, Dept Chem & Biol Engn, Tuscaloosa, AL 35487 USA
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Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Beijing Jiaotong Univ, Dept Phys, Beijing 100044, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Li, H. D.
Wang, Z. Y.
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Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wang, Z. Y.
Kan, X.
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Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Kan, X.
Guo, X.
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Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Guo, X.
He, H. T.
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机构:
Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
He, H. T.
Wang, Z.
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机构:
Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wang, Z.
Wang, J. N.
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Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wang, J. N.
Wong, T. L.
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Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wong, T. L.
Wang, N.
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Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
Wang, N.
Xie, M. H.
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Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R ChinaUniv Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China